pure 99.95% tungsten target tungsten disc for industry

Short Description:

A tungsten target (often called a tungsten sputtering target) is a high-purity piece of the metal tungsten used in a process called sputtering to create extremely thin, high-performance films on materials like silicon wafers or glass.


Product Detail

Product Tags

Product Descriptions

Tungsten target material is a crucial high-purity metal material in industries such as semiconductors, display panels, and solar cells. It is mainly used in physical vapor deposition processes, especially magnetron sputtering technology, to form extremely thin conductive or functional films.

Product Specifications

 

Dimensions As your requirement
Place of Origin Luoyang,Henan
Brand Name FGD
Application Medical, Industry,semiconductor
Shape Round
Surface Polished
Purity 99.95%
Grade W1
Density 19.3g/cm3
Melting point 3420℃
Boiling point 5555℃
tungsten target (2)

Chemical Compositon

           Main components

W>99.95%

Impurity content≤

Pb

0.0005

Fe

0.0020

S

0.0050

P

0.0005

C

0.01

Cr

0.0010

Al

0.0015

Cu

0.0015

K

0.0080

N

0.003

Sn

0.0015

Si

0.0020

Ca

0.0015

Na

0.0020

O

0.008

Ti

0.0010

Mg

0.0010

Common specifications

Diameter

φ25.4mm φ50mm φ50.8mm φ60mm φ76.2mm φ80.0mm φ101.6mm φ100mm
Thickness 3mm 4mm 5mm 6mm 6.35    

Why Choose Us

1. Our factory is located in Luoyang City, Henan Province. Luoyang is a production area for tungsten and molybdenum mines, so we have absolute advantages in quality and price;

2. Our company has technical personnel with over 15 years of experience, and we provide targeted solutions and suggestions for each customer's needs.

3. All of our products undergo strict quality inspection before being exported.

4. If you receive defective goods, you can contact us for a refund.

tungsten target (3)

Production Flow

1. Powder metallurgy method

(Press tungsten powder into shape and then sinter it at high temperature in a hydrogen atmosphere)

2. Preparation of Sputtering Target Materials

(Deposition of tungsten material onto a substrate to form a thin film)

3. hot isostatic pressing

(Densification treatment of tungsten material by simultaneously applying high temperature and high pressure)

4.Melting method

(Use high temperature to completely melt tungsten, and then make target materials through casting or other forming processes)

5. Chemical vapor deposition

(Method of decomposing gaseous precursor at high temperature and depositing tungsten on substrate)

Applications

Across all descriptions, tungsten targets are essential for high-tech thin-film deposition, including:

Semiconductors & Microelectronics: Creating conductive layers, diffusion barriers, and interconnects in integrated circuits (VLSI). 

 

Flat Panel Displays: Manufacturing TFT-LCD screens for high-definition TVs and monitors.

 

Solar Energy: Used in thin-film solar cells. 

 

Surface Engineering & Decorative Coatings: For tools, automotive lights, and architectural glass.

 

Medical & Industrial: X-ray tube components and general sputter coating applications.

tungsten target

Certificates

水印1
水印2

Shipping Diagram

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tungsten target (5)
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FAQS

What are the main advantages of tungsten target materials?

Molybdenum is often used as a target material in mammography due to its favorable properties for imaging breast tissue. Molybdenum has a relatively low atomic number, which means the X-rays it produces are ideal for imaging soft tissue such as the breast. Molybdenum produces characteristic X-rays at lower energy levels, making them ideal for observing subtle differences in breast tissue density.

In addition, molybdenum has good thermal conductivity properties, which is important in mammography equipment where repeated X-ray exposures are common. The ability to effectively dissipate heat helps maintain the stability and performance of X-ray tubes over extended periods of use.

Overall, the use of molybdenum as a target material in mammography helps optimize the quality of breast imaging by providing appropriate X-ray properties for this specific application.

What are the disadvantages of tungsten target materials?

High brittleness: Tungsten target materials have high brittleness and are susceptible to impact and vibration, which may cause damage.
High manufacturing cost: The manufacturing cost of tungsten target material is relatively high because its production process requires a series of complex procedures and high-precision processing equipment.
Welding difficulty: Welding tungsten target materials is relatively difficult and requires special welding processes and techniques to ensure the integrity of their structure and performance.
High coefficient of thermal expansion: Tungsten target material has a high coefficient of thermal expansion, so when used in high temperature environments, attention should be paid to its size changes and the influence of thermal stress.


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