Tuam Tshoj Tantalum phiaj TA1 hlau tantalum sputtering lub hom phiaj nrog siab purity ntau tshaj 99.95% Chaw tsim tshuaj paus thiab tsum |Forged tungsten

99.95% Ntshiab Tantalum Sputtering Target

Lus piav qhia luv luv:

Qhov Chaw Keeb Kwm:Henan, Suav teb

Hom Lub Npe:Luoyang Forged

Qauv nab npawb:Ta1

Khoom siv:Tantalum

Nto:caustic ntxuav / polishing

Qhov Loj:ntau yam

Ceev:16.7g / cm3

Purity:> = 99.95%

Qhov xwm txheej:Nqus annealing/temper/quench

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Txoj Kev Ntau Lawm Ntawm Tantalum Sputtering Target

Tantalum sputtering lub hom phiaj feem ntau yog tsim los ntawm cov txheej txheem hmoov metallurgy.

Nyob rau hauv txoj kev no, tantalum hmoov yog compacted thiab sintered los ua ib tug khoom tantalum phaj.Cov nplooj ntawv sintered yog tom qab ntawd ua tiav los ntawm ntau txoj kev tsim, xws li machining lossis dov, kom tau txais qhov xav tau qhov ntev thiab qhov chaw tiav.Cov khoom kawg yog tom qab ntawd ntxuav thiab tshuaj xyuas kom ntseeg tau tias nws ua tau raws li qhov tshwj xeeb xav tau rau daim ntawv thov sputtering.Txoj kev tsim khoom no ua kom ntseeg tau tias tantalum sputtering lub hom phiaj muaj qhov tsim nyog purity, ntom thiab microstructure kom ua tiav qhov kev ua tau zoo hauv cov txheej txheem nyias zaj duab xis.

Kev siv ntawmTantalum Sputtering Target

Tantalum sputtering lub hom phiaj yog siv nyob rau hauv lub sputter deposition txheej txheem, ib txoj kev ntawm depositing nyias films ntawm ntau yam ntaub ntawv mus rau ib tug substrate.Nyob rau hauv cov ntaub ntawv ntawm tantalum sputtering lub hom phiaj, lawv yog siv los tso tantalum nyias zaj duab xis mus rau ntau qhov chaw, xws li semiconductor wafers, zaub coatings, thiab lwm yam khoom siv hluav taws xob.Thaum lub sij hawm sputter deposition txheej txheem, tantalum sputtering lub hom phiaj yog bombarded los ntawm high-zog ions, ua rau tantalum atoms yuav ejected ntawm lub hom phiaj thiab tso rau ntawm lub substrate nyob rau hauv daim ntawv ntawm ib tug nyias zaj duab xis.Cov txheej txheem tso cai rau kev tswj xyuas cov yeeb yaj kiab tuab thiab sib xws, ua rau nws yog ib txoj hauv kev tseem ceeb rau kev tsim khoom siv hluav taws xob thiab lwm yam khoom siv high-tech.Tantalum sputtering lub hom phiaj muaj nuj nqis rau lawv qhov siab melting point, tshuaj inertness, thiab compatibility nrog ntau yam ntawm cov ntaub ntawv substrate, ua rau lawv zoo tagnrho rau cov ntawv thov uas yuav tsum tau ua kom ntev thiab zoo films.Cov hom phiaj no feem ntau yog siv rau hauv kev tsim cov capacitors, kev sib xyaw ua ke thiab lwm yam khoom siv hluav taws xob.